Furnace LPCVD

The Tystar Mini Tytan Furnace Stack contains two low pressure tubes that are used to process batches of up to 25 6-inch or 4-inch wafers. The tubes are dedicated to  LPCVD growth of Silicon Nitride growth and LPCVD Silicon Oxide growth using the TEOS precursor. The LPCVD TEOS process is ideal for conformal step coverage or trench refill applications.

Equipment Type

Furnace Stack

Manufacturer

Tystar

Model

Mini Tytan 4600

Location

Plasma Bay

Processes

LPCVD Silicon Nitride (Stoichiometric & Low Stress)

LPCVD Silicon Oxide (TEOS)