All Facilities | All Instruments Nanofabrication Facility Back Instruments and ToolsLithography 3D Lithography System › The Nanoscribe Photonic Professional 3D Lithography System is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists Curing Ovens › Two ultra-stable Blue M Ovens for soft and hard baking of photoresists Electron Beam Lithography System – 100 KeV › The Elionix ELS-G100 is a high speed, ultra high precision thermal field emission electron-beam lithography system. Electron Beam Lithography System – 50 KeV › The 50 KeV Elionix is a high speed lithography system optimized for large area and high speed pattern writing. Mask Aligner › The EVG620 Mask Aligner is equipped with high-resolution top and/or bottom side microscopes for single or double-side photolithography. Spin Coater – E-Beam Resists › The Brewer Science Cee Stand-Alone Spin Coater/hotplate is dedicated for the spinning of electron beam resists. Spin Coater – Photoresist and Other › Two additional Brewer Science Cee Spin Coaters are dedicated for photoresist processing and other non-standard materials UV Ozone Cleaner › The SAMCO UV-2 is a compact, benchtop, UV-ozone cleaning system that will not damage delicate electronic devices.