Spin Coater – Photoresist and Other

photo: Brewer Science photoresist and other materials spin coaters

Two additional Brewer Science Cee Spin Coaters are located in the fume hoods in the lithography bay. Spin coater #2 is dedicated for photoresist processing, and spin coater #3 is dedicated to all other non-standard materials, such as spin-on glasses, PVA, PPC, charge spreading layers for e-beam, and 3D laser lithography resists. The tools are capable of spin coating substrates up to 7” square or 200-mm round and features high torque for maximum ramping capability.  You can also spin coat smaller size substrates (<1 cm through 200 mm) using a wide array of spin-coating chuck sizes.

Specifications:

  • 0.1-second resolution for step times
  • Spin speed: 0 to 12,000 rpm
  • Spin speed acceleration:
    • 0 to 30,000 rpm/s unloaded
    • 0 to 23,000 rpm/s 200-mm substrate
    • 0 to 3,000 rpm/s 6” × 6” × 0.250” photomask recessed chuck

Contacts

  • Milan Begliarbekov, Ph.D.
    Technical Cleanroom Manager, Nanofabrication Facility
    Research Assistant Professor, Nanoscience Initiative
    mbegliarbekov@gc.cuny.edu

Manufacturer / Model

Brewer Science / Cee Model 200x-F

Facility

Nanofabrication Facility

Keywords

lithography