Equipment Type
Xenon Difluoride Etcher
Manufacturer
SPTS
Model
e1
Location
Plasma Bay
Processes
Isotropically etch Si, Ge, and Mo films and release layers
The SPTS Xactix E1 Xenon Difluoride Etcher can be used to isotropically etch Si, Ge, and Mo films. The XeF2 etch chemistry offers excellent selectivity to a wide range of materials, such as Al, SiO2, ZnO, Si3N4, and photoresist affording the possibility of using thin masks and incorporating etch-stop layers for undercutting.