| Equipment | Manufacturer | Badger Name | Academic Rate ($/hr) | Start-Up Rate ($/hr) | Industry Rate ($/hr) |
| Dicing Saw | Disco | Dicing_Saw_DAD3220 | 23 | 69 | 115 |
| Film Frame Wafer Mounter | Ultron Systems | Tape_Mount_UH114 | 0 | 0 | 0 |
| UV Curing System | Ultron Systems | UV _Curing_ UH102 | 0 | 0 | 0 |
| Wire Bonder | West Bond | Wire_Bonder_454647E | 23 | 69 | 115 |
| Spin Rinse Dryer | OEM Group | SRD_470S | 0 | 0 | 0 |
| HF / Piranha Hood | Air Control | HF_Piranha_Hood | 0 | 0 | 0 |
| Resist Hood | Air Control | Spinner_Hood | 0 | 0 | 0 |
| RCA Cleaning Hood | Air Control | RCA_Hood | 0 | 0 | 0 |
| Metal / Caustic Etch Hood | Air Control | Caustic_Hood | 0 | 0 | 0 |
| Development Hood | Air Control | Developer_Hood | 0 | 0 | 0 |
| Solvent Hood | Air Control | Solvent_Hood | 0 | 0 | 0 |
| Atomic Layer Deposition | Ultratech Cambridge NanoTech | ALD_Fiji | 30 | 90 | 150 |
| Thermal Evaporator | AJA International | Thermal_Evap_O3TH | 17 | 51 | 85 |
| Ebeam and Thermal Evaporator | AJA International | Ebeam_Evap_O8E | 33 | 99 | 165 |
| Sputtering System | AJA International | Sputter_O8 | 27 | 81 | 135 |
| PECVD | Oxford Instruments | PECVD_SYS100 | 40 | 120 | 200 |
| Sputter Coater | Cressington Scientific Instruments | Sputter_Coat_108A | 35 | 105 | 175 |
| UV Ozone Cleaner | SAMCO | UV_Ozone_UV2 | 15 | 45 | 75 |
| Inspection Microscope # 3 | Nikon Instruments | Scope3_Etch | 0 | 0 | 0 |
| Chlorine ICP Etcher | Oxford Instruments | ICP_Cl_SYS100 | 40 | 120 | 200 |
| Fluorine ICP Etcher | Oxford Instruments | ICP_Fl_SYS100 | 40 | 120 | 200 |
| DRIE Etcher | Oxford Instruments | DRIE_FL_SYS100 | 45 | 135 | 225 |
| Plasma Asher | PVA TePla | Plasma_Asher_ION40 | 20 | 60 | 100 |
| Reactive Ion Etcher | Oxford Instruments | RIE_NPG80 | 35 | 105 | 175 |
| Vapor HF Etcher | SPTS Technologies | VaporHF_Primaxx | 20 | 60 | 100 |
| Xenon Difluoride Etcher | SPTS Technologies | XeF2_Etch_E1 | 25 | 75 | 125 |
| Electron Beam Lithography | Elionix | EBL_Elionix | 55 | 165 | 275 |
| Photo Resist Spinner | Brewer Scientific | Photo_Spinner | 18 | 54 | 90 |
| Ebeam Resist Spinner | Brewer Scientific | EBL_Spinner | 18 | 54 | 90 |
| Non Standard Materials Spinner | Brewer Scientific | Other_Spinner | 18 | 54 | 90 |
| Mask Aligner | EV Group | Mask_Aligner_EVG620 | 28 | 84 | 140 |
| Photoresist Oven - Prebake | Thermal Product Solutions | Prebake_Oven | 0 | 0 | 0 |
| Photoresist Oven - Postbake | Thermal Product Solutions | Postbake_Oven | 0 | 0 | 0 |
| 3D Lithography System | Nanoscribe | 3DLitho_GT | 38 | 114 | 190 |
| Inspection Microscope # 1 | Nikon Instruments | Scope1_Litho | 0 | 0 | 0 |
| Scanning Electron Microscope | FEI | SEM_NovaNano | 30 | 90 | 150 |
| Inspection Microscope #2 | Nikon Instruments | Scope2_Metrology | 0 | 0 | 0 |
| Surface Profilometer | Bruker | Stylus_Prof_Dektak | 18 | 54 | 90 |
| Ellipsometer | J.A. Woollam | Ellipsometer_VVase | 18 | 54 | 90 |
| Atomic Force Microscope | Bruker | AFM_Dimension | 28 | 84 | 140 |
| Optical Profilometer | Bruker | Optical_Prof_GT-I | 18 | 54 | 90 |
| Thin Film Analyzer | Filmetrics | Reflectometer_F20 | 0 | 0 | 0 |
| Rapid Thermal Annealer | MPT | RTA_600S | 20 | 60 | 100 |
| Furnace - LPCVD Nitride | Tystar | Furnace_Nitride | 45 | 135 | 225 |
| Furnace - LPCVD TEOS | Tystar | Furnace_TEOS | 45 | 135 | 225 |
| Furnace - Anneal | Tystar | Furnace_Anneal | 25 | 75 | 125 |
| Furnace - Thermal Oxide | Tystar | Furnace_Thermal_Oxide | 35 | 105 | 175 |
