All Facilities | All Instruments
Nanofabrication Facility
Instruments and Tools
Lithography
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3D Lithography System ›
The Nanoscribe Photonic Professional 3D Lithography System is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists
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Curing Ovens ›
Two ultra-stable Blue M Ovens for soft and hard baking of photoresists
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Electron Beam Lithography System – 100 KeV ›
The Elionix ELS-G100 is a high speed, ultra high precision thermal field emission electron-beam lithography system.
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Electron Beam Lithography System – 50 KeV ›
The 50 KeV Elionix is a high speed lithography system optimized for large area and high speed pattern writing.
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Mask Aligner ›
The EVG620 Mask Aligner is equipped with high-resolution top and/or bottom side microscopes for single or double-side photolithography.
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Spin Coater – E-Beam Resists ›
The Brewer Science Cee Stand-Alone Spin Coater/hotplate is dedicated for the spinning of electron beam resists.
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Spin Coater – Photoresist and Other ›
Two additional Brewer Science Cee Spin Coaters are dedicated for photoresist processing and other non-standard materials
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UV Ozone Cleaner ›
The SAMCO UV-2 is a compact, benchtop, UV-ozone cleaning system that will not damage delicate electronic devices.