Oxford Instruments Suite Delivered to the CUNY ASRC NanoFab

In preparation for the upcoming opening of the CUNY Advanced Science Research Center NanoFabrication Facility, the staff has been busy finalizing the facilities design and receiving and commissioning instruments. Pictured above is a recent delivery from Oxford Instruments of the plasma assisted etching and deposition suite which consists of two inductively coupled plasma etchers, a reactive ion etcher and a load-locked chemical vapor deposition system. This instrument suite, in conjunction with the rest of the planned fabrication and characterization equipment will be utilized to fabricate nanostructures in the clean-room environment.