Xenon Difluoride Etcher

photo: STPT Exatix e1 Xenon Difluoride Etcher

The SPTS Xactix E1 Xenon Difluoride Etcher can be used to isotropically etch Si, Ge, and Mo films. The XeF2 etch chemistry offers excellent selectivity to a wide range of materials, such as Al, SiO2, ZnO, Si3N4, and photoresist affording the possibility of using thin masks and incorporating etch-stop layers for undercutting.

Processes

  • Isotropically etch Si, Ge, and Mo films and release layers

Contacts

  • Milan Begliarbekov, Ph.D.
    Technical Cleanroom Manager, Nanofabrication Facility
    Research Assistant Professor, Nanoscience Initiative
    mbegliarbekov@gc.cuny.edu

Manufacturer / Model

SPTS / Xatix e1

Facility

Nanofabrication Facility

Keywords

etching