Vapor Hydrofluoric Acid Etcher

photo: SPTS Primaxx Vapor HF Etcher

The SPTS Primaxx Vapor HF Etcher is used primarily for isotropic etching of all types of SiO2 and offers a safer alternative to liquid- HF processes. Furthermore, the dry-HF process eliminates the stiction problems often encountered in releasing SOI-MEMS devices.

Processes

  • Isotropic etching of all types of SiO2

Contacts

  • Milan Begliarbekov, Ph.D.
    Technical Cleanroom Manager, Nanofabrication Facility
    Research Assistant Professor, Nanoscience Initiative
    mbegliarbekov@gc.cuny.edu

Manufacturer / Model

STPS / Primaxx

Facility

Nanofabrication Facility

Keywords

etching