![photo: SAMCO UV ozone cleaner](https://asrc.gc.cuny.edu/wp-content/uploads/media/instruments/uv-ozone-cleaner/nanofab-lithography-uv-zone-cleaner.jpg)
UV Ozone Cleaner
![photo: SAMCO UV ozone cleaner](https://asrc.gc.cuny.edu/wp-content/uploads/media/instruments/uv-ozone-cleaner/nanofab-lithography-uv-zone-cleaner.jpg)
The SAMCO UV-2 is a compact, benchtop, UV-ozone cleaning system that will not damage delicate electronic devices. The system utilizes a combination of ultraviolet radiation, ozone, and heat to organic materials from a variety of substrates; these include silicon, gallium arsenide, sapphire, metals, ceramics, quartz and glass. The UV-1 is suited for applications involving substrate cleaning, photoresist descumming, improving wettability and UV curing. The system is compatible with substrates up to 150 mm in diameter and up to 15 mm-thick. The substrate heater is capable of temperatures from ambient to 300 C.
Contacts
- Jane Vogel
Equipment Technician, Nanofabrication Facility
jvogel@gc.cuny.edu