Spin Rinse Dryer

photo: OEM Spin Rinse Dryer

The spin rinse dryer offers a fast way to clean and dry wafers in patches up to 25 wafers at a time.

Processes

Rinse and dry 4″ and 6″ wafers


Contacts

  • Milan Begliarbekov, Ph.D.
    Technical Cleanroom Manager, Nanofabrication Facility
    Research Assistant Professor, Nanoscience Initiative
    mbegliarbekov@gc.cuny.edu

Manufacturer / Model

OEM / 470S

Facility

Nanofabrication Facility

Keywords

backend