Spin Rinse Dryer
The spin rinse dryer offers a fast way to clean and dry wafers in patches up to 25 wafers at a time.
Processes
Rinse and dry 4″ and 6″ wafers
Contacts
- Shawn Kilpatrick
Lab Manager, Nanofabrication Facility
skilpatrick@gc.cuny.edu
The spin rinse dryer offers a fast way to clean and dry wafers in patches up to 25 wafers at a time.
Rinse and dry 4″ and 6″ wafers