![photo: OEM Spin Rinse Dryer](https://asrc.gc.cuny.edu/wp-content/uploads/media/instruments/spin-rinse-dryer/nanofab-back-end-spin-rinse-dryer.jpg)
Spin Rinse Dryer
![photo: OEM Spin Rinse Dryer](https://asrc.gc.cuny.edu/wp-content/uploads/media/instruments/spin-rinse-dryer/nanofab-back-end-spin-rinse-dryer.jpg)
The spin rinse dryer offers a fast way to clean and dry wafers in patches up to 25 wafers at a time.
Processes
Rinse and dry 4″ and 6″ wafers
Contacts
- Shawn Kilpatrick
Lab Manager, Nanofabrication Facility
skilpatrick@gc.cuny.edu
The spin rinse dryer offers a fast way to clean and dry wafers in patches up to 25 wafers at a time.
Rinse and dry 4″ and 6″ wafers