Rapid Thermal Anneal (RTA)

photo: Rapid Thermal Anneal (RTA) system

The Allwin21 AccuThermo AW610 is a rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. The process periods are typically 1‑600 seconds in duration, although periods of up to 9999 seconds can be selected.

Specifications

  • Wafer sizes: Small pieces, 2″, 3″, 4″, 5″, 6″ wafer capability
  • Recommended ramp up rate: Programmable, 10°C to 120°C per second.
  • Recommended steady state duration: 0-300 seconds per step.
  • Ramp down rate: Non-programmable, 10°C to 200°C per second.
  • Recommended steady state temperature range: 150°C – 800°C.

Contacts

  • Milan Begliarbekov, Ph.D.
    Technical Cleanroom Manager, Nanofabrication Facility
    Research Assistant Professor, Nanoscience Initiative
    mbegliarbekov@gc.cuny.edu

Manufacturer / Model

Allwin21 Corporation / AW610

Facility

Nanofabrication Facility

Keywords

thermal processing