PHI Versaprobe II X-ray Photoelectron Spectroscope

The core technology of the VersaProbe II is PHI’s patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Standard features include PHI’s patented dual beam charge neutralization technology, a floating column Ar ion gun for XPS sputter depth profiling. Multi-technique options include a scanning electron gun for submicron surface analysis by Auger Electron Spectroscopy and a UV lamp for Ultra-violet Photoelectron Spectroscopy (UPS) measurements. New features with VersaProbe II include a 128 channel detector, a new SmartSoft user interface, and optional 20 kV C60+, and 20 kV Ar2500+ cluster source ion guns for polymer and organic thin film analysis.


  • Dual beam charge neutralization
  • Floating column argon ion gun
  • Compucentric Zalar rotation
  • Angle dependent XPS
  • 20 kV C60+ ion gun
  • 20 kV Ar2500+ gas cluster ion gun
  • UV light source for UPS
  • Hot / Cold sample manipulator


  • Tai-De Li, Ph.D.
    Manager, Surface Science Facility
    Research Associate Professor, Nanoscience Initiative

Manufacturer / Model

Physical Electronics / VersaProbe II XPS


Surface Science Facility