PHI Versaprobe II X-ray Photoelectron Spectroscope

The core technology of the VersaProbe II is PHI’s patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Standard features include PHI’s patented dual beam charge neutralization technology, a floating column Ar ion gun for XPS sputter depth profiling. Multi-technique options include a scanning electron gun for submicron surface analysis by Auger Electron Spectroscopy and a UV lamp for Ultra-violet Photoelectron Spectroscopy (UPS) measurements. New features with VersaProbe II include a 128 channel detector, a new SmartSoft user interface, and optional 20 kV C60+, and 20 kV Ar2500+ cluster source ion guns for polymer and organic thin film analysis.

Specifications

• Dual beam charge neutralization
• Floating column argon ion gun
• Compucentric Zalar rotation
• Angle dependent XPS
• 20 kV C60+ ion gun
• 20 kV Ar2500+ gas cluster ion gun
• UV light source for UPS
• Hot / Cold sample manipulator

Contacts

• Tai-De Li, Ph.D.
  Manager, Surface Science Facility
  Research Associate Professor, Nanoscience Initiative
  tli@gc.cuny.edu