LPCVD Furnace Stack

photo: mini tytan 4600 furnace stack

The Tystar Mini Tytan Furnace Stack contains two low pressure tubes that are used to process batches of up to 25 6-inch or 4-inch wafers. The tubes are dedicated to  LPCVD growth of Silicon Nitride growth and LPCVD Silicon Oxide growth using the TEOS precursor. The LPCVD TEOS process is ideal for conformal step coverage or trench refill applications.

Processes

  • LPCVD Silicon Nitride (Stoichiometric & Low Stress)
  • LPCVD Silicon Oxide (TEOS)

Contacts

  • Milan Begliarbekov, Ph.D.
    Technical Cleanroom Manager, Nanofabrication Facility
    Research Assistant Professor, Nanoscience Initiative
    mbegliarbekov@gc.cuny.edu

Manufacturer / Model

Tystar / Mini Tytan 4600

Facility

Nanofabrication Facility

Keywords

deposition