Electron Beam Lithography System – 50 KeV

The 50 KeV Elionix is a high speed lithography system optimized for large area and high speed pattern writing. The tool offers write fields up to 1.5 millimeters and currents up to 800 nA. The smallest resolvable features on the tool are approximately 40 nanometers.

Contacts

• Samantha Roberts, Ph.D.
  Nanofabrication Facility Director, Nanofabrication Facility
  sroberts@gc.cuny.edu