3D Lithography System

The Nanoscribe Photonic Professional 3D Lithography System is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists. Designed for the fabrication of photonic crystal structures, the instrument is also ideal for, e.g., generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry.

Processes

• Compatible Materials Nanoscribe resists : IP-L (780), IP-G (780) and IP-Dip SU-8 (25, 50, 100, …) Ormocere AZ MiR 701, AR-P 3210 AZ 5214, AZ 9260 Chalcogenide glass (As2S3) PEG-DA, PETA and many others …

Specifications

Optics and Resolution

• Class 3 120 mW, 780 nm, 150 fs, 80 MHz fiber laser
• 3D lateral feature size: ≤ 200 nm; typically 150 nm
• 2D lateral feature size: ≤ 150 nm; typically 120 nm
• 2D lateral resolution: ≤ 500 nm; typically 300 nm
• Vertical resolution: ≤ 1 μm; typically 800 nm
• Piezo range: 300 x 300 x 300 μm3
• Motorized xy-scanning stage range: 100 x 100 mm2

Contacts

• Shawn Kilpatrick
  Lab Manager, Nanofabrication Facility
  skilpatrick@gc.cuny.edu